A Simulation Study of Junctionless Forksheet on Sub-2 nm Node Logic Applications

被引:2
|
作者
Shi, Xinlong [1 ]
Liu, Tao [2 ]
Wang, Ying [1 ]
Chen, Rui [1 ]
Zhang, Ningning [1 ]
Hu, Huiyong [1 ]
Xu, Min [2 ]
Wang, Liming [1 ]
机构
[1] Xidian Univ, Sch Microelect, Wide Bandgap Semicond Technol Disciplines State Ke, Xian 710071, Peoples R China
[2] Fudan Univ, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R China
关键词
Doping; Logic gates; Scattering; Capacitance; Performance evaluation; Impurities; Silicon; CMOS; froksheet; junctionless (JL); logic performance; MODEL; RECOMBINATION; TRANSISTORS; DEVICE; CMOS; CFET; GATE;
D O I
10.1109/TED.2023.3274621
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This article presents an evaluation of the CMOS logic performance of a junctionless (JL) forksheet based on 3-D numerical simulation. The study investigates the transfer characteristics and gate capacitance of the JL-forksheet with channel doping ranging from $\text{1}\ttimes\text{10}<^>{\text{19}}$ to $\text{6}\ttimes\text{10}<^>{\text{19}}/\text{cm}<^>{\text{3}}$ , to determine the optimal performance of the device. Results show that due to its lower gate capacitance, the JL-forksheet has a lower intrinsic delay than the IM-forksheet. Moreover, the JL-forksheet demonstrates improved logic performance in terms of rise time, fall time, propagation delay, and maximum oscillation frequency, with improvements of at least 25%, 35%, 17%, and 21%, respectively, as compared to the IM-forksheet. Based on its simple fabrication process, better power efficiency, and improved digital logic performance at the sub-2 nm technology node (N2), the JL-forksheet exhibits strong potential as a high-performance CMOS logic solution in the post-Moore era.
引用
收藏
页码:3413 / 3418
页数:6
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