Analysis of a second peak of electron density observed in high-power impulse magnetron sputtering plasma using a Langmuir probe

被引:1
作者
Chau, Kam-Hong [1 ,2 ]
Kawai, Yoshinobu [3 ,4 ]
Kan, Chi-Wai [2 ]
Syu, Jia-Lin [1 ,3 ]
Liu, Yen-Chun [1 ,3 ]
Chen, Ying-Hung [1 ,3 ]
Liang, Chen-Jui [3 ,5 ]
He, Ju-Liang [1 ,3 ]
机构
[1] Feng Chia Univ, Inst Plasma, 100 Wenhwa Rd, Taichung 40724, Taiwan
[2] Hong Kong Polytech Univ, Sch Fash & Text, Hung Hom, Kowloon, Hong Kong, Peoples R China
[3] Feng Chia Univ, Dept Mat Sci & Engn, 100 Wenhwa Rd, Taichung 40724, Taiwan
[4] Kyushu Univ, Interdisciplinary Grad Sch Engn Sci, Kasugakoen 6-1, Kasuga, Fukuoka 8168580, Japan
[5] Feng Chia Univ, Int Sch Technol & Management, 100 Wenhwa Rd, Taichung 40724, Taiwan
关键词
Langmuir probe; hot electron; Penning ionization; ion density; electron density; plasma physics; PARAMETERS;
D O I
10.35848/1347-4065/ad13a5
中图分类号
O59 [应用物理学];
学科分类号
摘要
Plasma characteristics of a high-power impulse magnetron sputtering (HIPIMS) for copper deposition were investigated using a time-resolved Langmuir probe to explore HIPIMS discharge physics. Various discharge frequencies and pulse widths were employed while operating the HIPIMS in a constant current mode. Waveforms of the HIPIMS cathode current remained constant throughout the HIPIMS voltage pulse. It was found that electrons exhibited a bi-Maxwellian energy distribution both during and after the HIPIMS pulse. After the HIPIMS pulse, plasma density built up to a second peak while the bulk electron temperature quickly decreased. By examining the effect of pulse width and discharge frequency on the temperature of hot electrons through Langmuir I-V curves, it is suggested that the hot electron ionization contributed to the occurrence of the second peak.
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页数:6
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