Optical and Soft X-ray Microlithography at the Turn of the Century

被引：1

作者：

Artyukov, I. A. ^{[1
]}

机构：

[1] Russian Acad Sci, Lebedev Phys Inst, Moscow 119991, Russia

来源：

BULLETIN OF THE LEBEDEV PHYSICS INSTITUTE | 2023年 / 50卷 / SUPPL 4期

关键词：

photolithography; X-ray optics; multilayer X-ray optics; soft X-ray projection lithography; EUV lithography; LITHOGRAPHY;

D O I：

10.3103/S1068335623160029

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

A review is presented of the development of methods of industrial excimer laser photolithography and soft X-ray projection lithography at the end of the 20th century and the beginning of the 21st century. The contribution of N.G. Basov and his colleagues at FIAN and MEPhI to the development of this direction is revealed.

引用

页码：S426 / S434

页数：9

共 47 条

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