An Ultra-Dense One-Transistor Ternary-Content-Addressable Memory Array Based on Non-Volatile and Ambipolar Fin Field-Effect Transistors

被引:9
|
作者
Zhang, Zhaohao [1 ,2 ]
Mao, Shujuan [3 ]
Xu, Gaobo [1 ,2 ]
Zhang, Qingzhu [1 ,2 ]
Wu, Zhenhua [1 ,2 ]
Yin, Huaxiang [1 ,4 ]
Ye, Tianchun [1 ,2 ]
机构
[1] Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China
[2] Univ Chinese Acad Sci, Sch Integrated Circuits, Beijing 100049, Peoples R China
[3] Beijing Superstring Acad Memory Technol, Beijing 100176, Peoples R China
[4] Univ Chinese Acad Sci, Binzhou Weiqiao Adv Technol Inst, Beijing 100049, Peoples R China
基金
中国国家自然科学基金;
关键词
Iron; FinFETs; Performance evaluation; Films; Logic gates; Electric potential; Capacitors; Ambipolar; content addressable storage; fin field-effect transistor (FinFET); metallic source and drain (MSD); non-volatile memory; SEARCH; DESIGN; CELL; TCAM;
D O I
10.1109/TED.2023.3239330
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
An ultra-dense one-transistor (1T) ternary content addressable memory (TCAM) array is reported that is based on high-performance, non-volatile, and ambipolar ferroelectric (Fe) silicon-on-insulator (SOI) fin field-effect transistors (FinFETs). Because of the multistates in the Fe layer and the ambipolar characteristics, TCAM functions were realized on a single device. From the advanced CMOS process and the metallic source and drain (MSD) engineering, a maximum driving ON-current of similar to 0.1 mu A/mu m and a similar to 1000 ON/OFF ratio at V-GS = -0.25 V were realized for the 1T TCAM cell. This indicated large-array integration feasibility. In addition, 2 x 2 and 1 x 8 TCAM arrays are demonstrated. The quasi-linear dependence of a matching line (ML) voltage with the number of mismatched bits indicated a potential for Hamming-distance computing in area-and energy-efficient artificial intelligence (AI) processors.
引用
收藏
页码:1029 / 1033
页数:5
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