Performance of Schottky diode of structured FTO/TiO2/Al employing hydrogen fluoride treated TiO2: Qualitative and quantitative analysis

被引:1
作者
Sk, Ramjan [1 ]
Biswas, Animesh [1 ,2 ]
Layek, Animesh [1 ]
Ray, Partha Pratim [1 ]
机构
[1] Jadavpur Univ, Dept Phys, Kolkata 700032, India
[2] Sreegopal Banerjee Coll, Dept Phys, Mogra 712148, India
关键词
HF treatment; TiO2; nanoparticles; Schottky device; Mobility; Resistivity; Carrier concentration; TITANIUM-DIOXIDE; THIN-FILM; SURFACES;
D O I
10.1016/j.chemphys.2024.112233
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Having ascertained the improvement of band gap and conductivity of the synthesized TiO2 after HF treatment under consideration, it occurred to us that the materials may perform as the better Schottky barrier diode. To verify our presumption, we studied the I-V characteristic of the device fabricated in a sandwich configuration of FTO/sample/Al. The comparative studies show better potentiality of the material in subject to study the qualitative and quantitative measures of the Schottky devices. The work is concluded by examined the various characteristic parameters related with performance of device that is fabricated with HF treated and untreated TiO2.
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页数:7
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