Probing Sulfur Vacancies in CVD-Grown Monolayer MoS2 on SiO2/Si in the Temperature Range 750-900°C

This work reports morphologically alike, high-quality monolayer MoS2 flakes with a similar strain at various growth temperatures (750-900 degrees C) achieved by adjusting sulfur temperature. The growth dynamics of MoS2 are correlated with changes in the photoluminescence (PL) and Raman peak positions. Monolayer MoS2 crystals are synthesized at different growth temperatures from 750 degrees C to 900 degrees C using chemical vapor deposition (CVD). We examined the structural quality and aimed to extract the recombination mechanisms in MoS2 using low-temperature, variable, and low-laser-intensity PL measurements. Our studies of the defect-associated bound exciton emission are well correlated with the blueshift in the A(1g) mode of Raman spectra, blueshift in PL spectra, and x-ray photoelectron spectroscopy results for crystal grown at 900 degrees C. Our research findings not only shed light on a thorough, non-intrusive method for modifying growth parameters to enhance optical performance, but they also suggest a way to modify the optical characteristics of MoS2 while maintaining the morphology.