Different 2D and 3D mask constraints synthesis for large array pattern shaping

In this article, different 2D and 3D mask styles for synthesizing large array pattern shaping to meet the requirements of modern applications are realized. The composition of the different beam pattern shaping is achieved by comparing the array factor with the proposed masks whose details (upper and lower borders) are predefined according to the designer. The generated pattern shapes are as follows: unscanned 2D single-pencil beam, scanned 2D pencil beam, 2D multi-beam scanning, 2D wide flat beam with little ripple, unscanned 3D single-pencil beam, 3D multi-beam scanning, and footprint (or contour) pattern for linear and planar arrays. The process of constructing these patterns is followed by predicting the amplitude-only weights (i.e., the phase weighting is considered zero in all computations) of the elements using the particle swarm optimization algorithm. In all proposed masks, different sidelobe levels are controlled, ranging from -20 to -100 dB. Also, the radiated beamwidth is controlled, ranging from 0.1334 rad (7.6 deg.) to 0.4 rad (23 deg.). The analysis and construction of linear and planar array arrangements depend on the formulation of antenna array theory through the implementation of the proposed (estimated) equations using MATLAB code. The simulation results showed the effectiveness of the proposed methods in controlling the pattern shape according to the required modern trends.