Femtosecond laser-induced nano- and microstructuring of Cu electrodes for CO2 electroreduction in acetonitrile medium

被引：3

作者：

Gnilitskyi, Iaroslav ^{[1
,2
,3
]}

Bellucci, Stefano ^{[3
]}

Marrani, Andrea Giacomo ^{[4
]}

Shepida, Mariana ^{[1
]}

Mazur, Artur ^{[1
]}

Zozulya, Galyna ^{[1
]}

Kordan, Vasyl ^{[5
]}

Babizhetskyy, Volodymyr ^{[5
]}

Sahraoui, Bouchta ^{[6
]}

Kuntyi, Orest ^{[1
]}

机构：

[1] Lviv Polytech Natl Univ, 12 Bandery Str, UA-79013 Lvov, Ukraine

[2] NoviNano Lab LLC, 5 Pasternaka, UA-79000 Lvov, Ukraine

[3] INFN Lab Nazl Frascati, Via E Fermi 54, I-00044 Frascati, Italy

[4] Univ Roma La Sapienza, Dipartimento Chim, p le A Moro 5, I-00185 Rome, Italy

[5] Ivan Franko Natl Univ Lviv, Dept Inorgan Chem, 6 Kyryla & Mefodiya Str, UA-79005 Lvov, Ukraine

[6] Univ Angers, Photon Lab Angers LPhiA, SFR MATRIX, 2 Bd Lavoisier, F-49045 Angers, France

来源：

SCIENTIFIC REPORTS | 2023年 / 13卷 / 01期

基金：

新加坡国家研究基金会;

关键词：

CARBON-DIOXIDE; ELECTROCHEMICAL REDUCTION; COPPER ELECTRODES; ELECTROLYSIS CELL; SURFACE; EMISSIONS; PRODUCTS; RIPPLES; FILMS; WATER;

D O I：

10.1038/s41598-023-35869-z

中图分类号：

O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];

学科分类号：

07 ; 0710 ; 09 ;

摘要：

The dependency of CO2 reduction rate in acetonitrile-Bu4NClO4 solution on cathodes, which were modified by laser induction of a copper surface, was studied. The topography of laser-induced periodic surface structures (LIPSS) -> grooves -> spikes was successively formed by a certain number of pulses. It was proved that for a higher number of laser pulses, the surface area of the copper cathode increases and preferred platy orientation of the copper surface on [022] crystallografic direction and larger fluence values increase. At the same time, the content of copper (I) oxide on the surface of the copper cathode increases. Also, the tendency to larger fluency values is observed. It promotes the increase of cathodic current density for CO2 reduction, which reaches values of 14 mA cm(-2) for samples with spikes surface structures at E = - 3.0 V upon a stable process.

引用

页数：10

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