Structural, magnetic and Magnetic-Microstructural properties of sputtered FeCoNi thin films

被引:8
作者
Kunwar, Suraj [1 ,2 ]
Chelvane, J. Arout [1 ]
Raja, M. Manivel [1 ]
机构
[1] Def Met Res Lab, Hyderabad, India
[2] Natl Inst Technol, Dept Met & Mat Engn, Warangal, India
关键词
CO-FE; ELECTRODEPOSITION; BEHAVIOR; ALLOYS; SOFT;
D O I
10.1016/j.jmmm.2023.170597
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This paper reports the effect of growth rate and substrate temperature on the composition, structure, microstructure, magnetic and magnetic microstructural properties of Fe-Co-Ni alloy thin films. 200 nm thick Fe-Co-Ni thin films were grown by high power impulse magnetron sputtering on Si 100 at different growth rates (viz., 1 - 2.4 angstrom/s). Films were also thermally processed by modifying the substrate temperatures. Room temperature deposited films showed the presence of FCC structure for all the films. However, films grown at higher substrate temperatures displayed presence of BCC phase co-existing with FCC phase. High saturation magnetization combined with low coercivity has been obtained for the Fe-Co-Ni films grown at higher growth rate and enhanced substrate temperature. Magne-tization and magnetic microstructural studies using Kerr microscopy showed anisotropic magnetic properties along the plane of the film with the magnetization reversal dominated by domain wall motion and domain wall rotation.
引用
收藏
页数:11
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