共 50 条
Recent Progress of Oligomeric Non-Fullerene Acceptors for Efficient and Stable Organic Solar Cells
被引:12
|作者:
Qi, Feng
[1
,3
]
Li, Yanxun
[2
,3
]
Lin, Francis R.
[1
,3
]
Jen, Alex K. -Y.
[1
,3
,4
,5
]
机构:
[1] City Univ Hong Kong, Dept Chem, Kowloon, Hong Kong 999077, Peoples R China
[2] City Univ Hong Kong, Dept Mat Sci & Engn, Kowloon, Hong Kong 999077, Peoples R China
[3] City Univ Hong Kong, Hong Kong Inst Clean Energy, Kowloon, Hong Kong 999077, Peoples R China
[4] City Univ Hong Kong, State Key Lab Marine Pollut, Kowloon, Hong Kong 999077, Peoples R China
[5] Univ Washington, Dept Mat Sci & Engn, Seattle, WA 98195 USA
来源:
关键词:
Oligomeric Non-Fullerene Acceptors;
Conjugated Spacer;
Flexible Linker;
Organic Solar Cells;
STABILITY;
PHOTOVOLTAICS;
MORPHOLOGY;
TRANSPORT;
DESIGN;
D O I:
10.1002/cssc.202301559
中图分类号:
O6 [化学];
学科分类号:
0703 ;
摘要:
Organic solar cells (OSCs) have achieved remarkable power conversion efficiencies (PCEs) of over 19 % in the past few years due to the rapid development of non-fullerene acceptors (NFAs). However, the operational stability remains a great challenge that inhibits their commercialization. Recently, oligomeric NFAs (ONFAs) have attracted great attention, which not only can deliver excellent device performance, but also improve the thermal-/photo- stability of OSCs. This is attributed to the suppressed molecular diffusion of ONFAs associated with their high glass-transition temperature (Tg) and improved thermodynamic properties of ONFAs. Herein, we focus on investigating the correction between the ONFA chemical structure, material properties, device performance, and stability. In addition, we also try to point out the challenges in synthesizing ONFAs and provide potential directions for future ONFA designs. Oligomeric non-fullerene acceptors have the advantages of defined molecular structure and low diffusion coefficient compared with polymer acceptors and small molecular acceptors, which can not only enhance the performance of organic solar cells, but also improve the thermal/photo stability of devices induced by the stable morphology. image
引用
收藏
页数:9
相关论文