Effect of interface on oxidation behavior and tribological properties of CrAlN/SiNx multilayer films

被引：6
作者：
He, Youxing [1 ,2 ]
Wang, Xiaobo [3 ]
Guo, Tao [1 ,2 ]
Gao, Kewei [1 ,2 ]
Pang, Xiaolu [1 ,2 ]
机构：
[1] Univ Sci & Technol Beijing, Beijing Adv Innovat Ctr Mat Genome Engn, Beijing 100083, Peoples R China
[2] Univ Sci & Technol Beijing, Sch Mat Sci & Engn, State Key Lab Adv Met & Mat, Beijing 100083, Peoples R China
[3] China United Gas Turbine Technol Co Ltd, Beijing 100015, Peoples R China
来源：
CERAMICS INTERNATIONAL | 2023年 / 49卷 / 01期
基金：
中国国家自然科学基金;
关键词：
Multilayer film; Interface; Diffusion; Oxidation resistance; Tribological properties; TIALN/SIN DECORATIVE FILMS; THERMAL-STABILITY; MECHANICAL-PROPERTIES; BOROSILICATE GLASS; THIN-FILMS; RESISTANCE; GROWTH; MICROSTRUCTURE;
D O I：
10.1016/j.ceramint.2022.09.118
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The oxidation resistance and tribological behavior of CrAlN/SiNx multilayer films with different interface structures were investigated. The multilayer film exhibited better oxidation resistance than the monolithic CrAlN film after oxidation at 900 degrees C and 1000 degrees C for 10 h. The crystalline SiNx sublayer was beneficial to oxidation resistance at 900 degrees C in contrast to the trend observed after oxidation at 1000 degrees C. The stacking faults generated in the multilayer film were induced by the oxidation of SiNx. The diffusion mechanism changed from the outward diffusion of cations to an inward diffusion of anions when the temperature was increased to 1000 degrees C. The multilayer film with a crystalline interface exhibited lower coefficient of friction (COF) and better tribological properties than the CrAlN film and multilayer with an amorphous interface.
引用
收藏
页码：1369 / 1380
页数：12
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