Electrical properties of cerium hexaboride gate hydrogen-terminated diamond field effect transistor with normally-off characteristics

被引:17
作者
Zhang, Minghui [1 ]
Wang, Wei [1 ]
Chen, Genqiang [1 ]
Wen, Feng [1 ]
Lin, Fang [1 ]
He, Shi [1 ]
Wang, Yanfeng [1 ]
Zhang, Longhui [1 ]
Fan, Shuwei [1 ]
Bu, Renan [1 ]
Min, Tai [2 ]
Yu, Cui [3 ]
Wang, Hongxing [1 ]
机构
[1] Xi An Jiao Tong Univ, Sch Elect Sci & Engn, Key Lab Phys Elect & Devices, Minist Educ, Xian 710049, Shaanxi, Peoples R China
[2] Xi An Jiao Tong Univ, Ctr Spintron & Quantum Syst, Sch Mat Sci & Engn, State Key Lab Mech Behav Mat, Xian 710049, Shaanxi, Peoples R China
[3] Hebei Semicond Res Inst, Natl Key Lab Applicat Specif Integrated Circuit, Shijiazhuang 050051, Hebei, Peoples R China
基金
中国博士后科学基金;
关键词
Hydrogen-terminated diamond; Field effect transistor; Normally-off; Cerium hexaboride; MOSFET;
D O I
10.1016/j.carbon.2022.08.056
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Fabrication of hydrogen-terminated (H-terminated) diamond field effect transistor (FET) with low work function cerium hexaboride (CeB6) gate material has been successfully performed. For the 8 Im gate length device, the threshold voltage (V-TH) is extracted to be -0.46 V, demonstrating a normally-off characteristics. The maximum drain source current density (I-Dmax) is -83.8 mA/mm, and the competitive M max may be ascribed to the undamaged two-dimensional hole gas channel. The interface state density (D-it) is evaluated to be 1.93 x 10(12) cm(-)(2).eV(-1), and the relatively low value may be attributed to the uncontaminated interface in gate material. This work provides a promising strategy to realize normally-off H-terminated diamond FET for fail-safety and energy-efficient power electronic devices.
引用
收藏
页码:71 / 75
页数:5
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