Gate Characteristics of Enhancement-Mode Fully Depleted p-GaN Gate HEMT

被引:10
作者
Sun, Jiahui [1 ]
Mouhoubi, Samir [2 ]
Silvestri, Marco [2 ]
Zheng, Zheyang [1 ]
Ng, Yat Hon [1 ]
Shu, Ji [1 ]
Chen, Kevin J. [1 ]
Curatola, Gilberto [2 ]
机构
[1] Hong Kong Univ Sci & Technol, Dept Elect & Comp Engn, Hong Kong, Peoples R China
[2] Huawei Nuremberg Res Ctr, D-90449 Nurnberg, Germany
关键词
HEMTs; Wide band gap semiconductors; Aluminum gallium nitride; Junctions; Gallium nitride; Magnesium; Fully depleted p-GaN; gate current; Mg activation; HIGH-THRESHOLD-VOLTAGE; ALGAN/GAN HEMTS; PERFORMANCE; METAL; HFET;
D O I
10.1109/LED.2023.3324011
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The conventional p-GaN in Schottky-type p-GaN gate HEMTs is converted into an insulator-like p-GaN, i.e., fully depleted p-GaN in the reverse-biased Schottky junction under forward gate bias (V-GS), by inadequate activation of Mg. Consequently, the gate current (I-G) is reduced by 3-5 orders of magnitude at VGS of 7-V over a temperature range of 25 degrees C-150 degrees C, compared with devices adopting conventional adequate activation. The fully depleted p-GaN converts the current-balance-based forward V-GS division in the conventional partially depleted p-GaN gate stack, into thickness-based voltage division in p-GaN and AlGaN between gate and channel, which is like that in a MIS (metal-insulator-semiconductor) gate. As a result, the hole current through the Schottky junction is significantly reduced while the electron spillover current starts to dominate at high forward VGS. Besides, hot carriers are excluded from the forward gate breakdown mechanism.
引用
收藏
页码:2015 / 2018
页数:4
相关论文
共 28 条
[1]   High-performance enhancement-mode AlGaN/GaN HEMTs using fluoride-based plasma treatment [J].
Cai, Y ;
Zhou, YG ;
Chen, KJ ;
Lau, KM .
IEEE ELECTRON DEVICE LETTERS, 2005, 26 (07) :435-437
[2]   Control of threshold voltage of AlGaN/GaN HEMTs by fluoride-based plasma treatment: From depletion mode to enhancement mode [J].
Cai, Yong ;
Zhou, Yugang ;
Lau, Kei May ;
Chen, Kevin J. .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2006, 53 (09) :2207-2215
[3]   GaN-on-Si Power Technology: Devices and Applications [J].
Chen, Kevin J. ;
Haeberlen, Oliver ;
Lidow, Alex ;
Tsai, Chun Lin ;
Ueda, Tetsuzo ;
Uemoto, Yasuhiro ;
Wu, Yifeng .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2017, 64 (03) :779-795
[4]  
Gotz W, 1996, APPL PHYS LETT, V68, P667, DOI 10.1063/1.116503
[5]   Frequency- and Temperature-Dependent Gate Reliability of Schottky-Type p-GaN Gate HEMTs [J].
He, Jiabei ;
Wei, Jin ;
Yang, Song ;
Wang, Yuru ;
Zhong, Kailun ;
Chen, Kevin J. .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2019, 66 (08) :3453-3458
[6]  
Hilt O., 2010, P 6 INT C INT POW EL, P1
[7]   Enhancement mode AlGaN/GaN HFET with selectively grown pn junction gate [J].
Hu, X ;
Simin, G ;
Yang, J ;
Khan, MA ;
Gaska, R ;
Shur, MS .
ELECTRONICS LETTERS, 2000, 36 (08) :753-754
[8]  
Hua MY, 2016, INT EL DEVICES MEET, DOI 10.1109/IEDM.2016.7838388
[9]  
Huang W, 2008, INT SYM POW SEMICOND, P295
[10]   p-GaN Gate HEMTs With Tungsten Gate Metal for High Threshold Voltage and Low Gate Current [J].
Hwang, Injun ;
Kim, Jongseob ;
Choi, Hyuk Soon ;
Choi, Hyoji ;
Lee, Jaewon ;
Kim, Kyung Yeon ;
Park, Jong-Bong ;
Lee, Jae Cheol ;
Ha, Jongbong ;
Oh, Jaejoon ;
Shin, Jaikwang ;
Chung, U-In .
IEEE ELECTRON DEVICE LETTERS, 2013, 34 (02) :202-204