Effect of defects in capacitance-voltage measurement of doping profiles in Ga2O3

被引:0
作者
Li, J. V. [1 ,2 ]
Neal, A. T. [1 ]
Asel, T. J. [1 ]
Kim, Y. [1 ]
Mou, S. [1 ]
机构
[1] Air Force Res Lab, Mat & Mfg Directorate, 2179 12th St, Wright Patterson AFB, OH 45433 USA
[2] Azimuth Corp, 2970 Presidential Dr 200, Fairborn, OH 45324 USA
关键词
Gallium oxide; Doping; Uniformity; Defect; Hysteresis; Capacitance-voltage; Schottky; SPECTROSCOPY;
D O I
10.1016/j.tsf.2023.140028
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We investigate the intermixing effects of doping profile and the carrier emission from deep levels in the capacitance-voltage measurement of the wide bandgap semiconductor material of 8-Ga2O3. Specifically, we find that the spatial non-uniformity of doping measured under practical conditions is substantially contributed by artifacts due to carrier emission from deep levels. We develop a procedure to measure the hysteresis in cyclic capacitance-voltage experiments in dark and at room temperature for probing of the deep levels contributing to the apparent doping profile. Analysis of this hysteresis in the dynamic electrostatic framework of a Schottky junction containing deep levels enables more accurate determination of the doping density and its spatial distribution, and simultaneously the extraction of energy, density, and capture cross-section of the deep levels.
引用
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页数:6
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