Chemical regulation in the bonding reconstruction stage of amorphous Zr-Si oxidation and the resultant phase selection

被引:6
作者
Cao, Guoqin [1 ]
Chen, Chaoyang [1 ]
Xu, Hongjie [1 ,2 ]
Ban, Jinjin [1 ]
Liu, Fanfan [1 ]
Yuan, Gaihuan [3 ]
Lei, Honghong [4 ]
Su, Yujie [2 ]
Hu, Junhua [1 ]
机构
[1] Zhengzhou Univ, State Ctr Int Cooperat Designer Low Carbon & Envi, Sch Mat Sci & Engn, Zhengzhou 450001, Peoples R China
[2] North China Univ Water Resources & Elect Power, Sino German Resources Environm & Geohazards Res Ct, Zhengzhou 450046, Peoples R China
[3] State Nucl Baoti Zirconium Ind Co Ltd SNZ, Baoji 721013, Peoples R China
[4] Foguang Power Generat Equipment Co Ltd, Henan Prov Key Lab Met Fuel Battery, 50 Holly St, Zhengzhou 450000, Peoples R China
基金
中国国家自然科学基金;
关键词
Oxidation; Diffusion; EELS; Bonding reconstruction; Stability; HIGH-TEMPERATURE OXIDATION; ZIRCONIUM-SILICIDE; X-RAY; CORROSION BEHAVIOR; THERMAL-OXIDATION; EVOLUTION; ALLOY; WATER; OXIDE; EDGE;
D O I
10.1016/j.matdes.2023.112291
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A mechanism based on oxidation induced bonding reconstruction (OBR) was proposed to optimize phase selection during oxidation of amorphous ZrxSi1-x (0.55 < x < 0.75). According to VASP modeling, a self-barrier effect was proposed to regulate the OBR and Zr/Si separation at initial oxidation stage. The depressed Si inner-diffusion leads to the formation of amorphous bilayer structure. A Si-rich Zr-Si layer formed underneath the outer Zr-Si-O amorphous layer, which synergistically impeded oxygen permeation at subcritical environment. As confirmed by EELS and XPS, the alternative of Zr-O and Si-O bonds in Zr-Si-O layer contributed to the enhanced hydro chemical stability.
引用
收藏
页数:10
相关论文
共 49 条
[1]   L2,3 EDGE OF SILICON - THEORY AND EXPERIMENT [J].
AEBI, P ;
KELLER, J ;
ERBUDAK, M ;
VANINI, F .
PHYSICAL REVIEW B, 1988, 38 (08) :5392-5396
[2]   Displacements, Mean-Squared Displacements, and Codisplacennents for the Calculation of Nonequilibrium Properties [J].
Agnihotri, Mithila V. ;
Chen, Si-Han ;
Beck, Corey ;
Singer, Sherwin J. .
JOURNAL OF PHYSICAL CHEMISTRY B, 2014, 118 (28) :8170-8178
[3]   Reactions and diffusion of water and oxygen molecules in amorphous SiO2 -: art. no. 055508 [J].
Bakos, T ;
Rashkeev, SN ;
Pantelides, ST .
PHYSICAL REVIEW LETTERS, 2002, 88 (05) :4
[4]   SILICON-L(2,3) NEAR-EDGE FINE-STRUCTURE IN CONFINED VOLUMES [J].
BATSON, PE .
ULTRAMICROSCOPY, 1993, 50 (01) :1-12
[5]   Electronic structure of ZrCuSiAs and ZrCuSiP by X-ray photoelectron and absorption spectroscopy [J].
Blanchard, Peter E. R. ;
Cavell, Ronald G. ;
Mar, Arthur .
JOURNAL OF SOLID STATE CHEMISTRY, 2010, 183 (07) :1536-1544
[6]   Formation and oxidation resistance of a new YSZ modified silicide coating on Mo-based alloy [J].
Cai, Zhenyang ;
Wu, Yonghuang ;
Liu, Huyun ;
Tian, Gengyu ;
Pu, Rong ;
Piao, Shengming ;
Tang, Xinyang ;
Liu, Sainan ;
Zhao, Xiaojun ;
Xiao, Lairong .
MATERIALS & DESIGN, 2018, 155 :463-474
[7]   A mechanism assessment for the anti-corrosion of zirconia coating under the condition of subcritical water corrosion [J].
Cao, Guoqin ;
Yun, Yifan ;
Xu, Hongjie ;
Yuan, Gaihuan ;
Hu, Junhua ;
Shao, Guosheng .
CORROSION SCIENCE, 2019, 152 :54-59
[8]   Electronic structure and electron energy-loss spectroscopy of ZrO2 zirconia -: art. no. 245116 [J].
Dash, LK ;
Vast, N ;
Baranek, P ;
Cheynet, MC ;
Reining, L .
PHYSICAL REVIEW B, 2004, 70 (24) :1-17
[9]   OXIDATION STUDIES OF CRYSTALLINE CVD SILICON-NITRIDE [J].
DU, HH ;
TRESSLER, RE ;
SPEAR, KE ;
PANTANO, CG .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (05) :1527-1536
[10]   EXAMINATION OF THIN-FILMS IN THE ZRO2-SIO2 SYSTEM BY TRANSMISSION ELECTRON-MICROSCOPY AND X-RAY-DIFFRACTION TECHNIQUES [J].
FARABAUGH, EN ;
FELDMAN, A ;
SUN, J ;
SUN, YN .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04) :1671-1674