XPS study of NiO thin films obtained by chemical vapor deposition

被引：7

作者：

Pagot, Gioele ^{[1
,2
]}

Benedet, Mattia ^{[3
,4
,5
,6
]}

Maccato, Chiara ^{[3
,4
,5
,6
]}

Barreca, Davide ^{[5
,6
]}

Di Noto, Vito ^{[1
,2
]}

机构：

[1] Univ Padua, Dept Ind Engn, Sect Chem Technol ChemTech, Via Marzolo 9, I-35131 Padua, PD, Italy

[2] Univ Padua, Dept Ind Engn, INSTM, Via Marzolo 9, I-35131 Padua, PD, Italy

[3] Padova Univ, Dept Chem Sci, Via Marzolo 1, I-35131 Padua, PD, Italy

[4] INSTM, Via Marzolo 1, I-35131 Padua, PD, Italy

[5] Padova Univ, CNR, ICMATE, Via Marzolo 1, I-35131 Padua, Italy

[6] Padova Univ, Dept Chem Sci, INSTM, Via Marzolo 1, I-35131 Padua, Italy

来源：

SURFACE SCIENCE SPECTRA | 2023年 / 30卷 / 02期

关键词：

NiO; thin films; chemical vapor deposition; x-ray photoelectron spectroscopy; NICKEL-OXIDE FILMS; ATOMIC LAYER DEPOSITION; X-RAY PHOTOEMISSION; PHYSICAL-PROPERTIES; GROWTH; MOCVD; METAL; NANOPARTICLES; PRECURSORS; COMPLEXES;

D O I：

10.1116/6.0003008

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

Nickel oxide (NiO) thin films are of great importance for a variety of technological applications, especially in (photo)electrocatalysis for clean energy production and pollutant degradation. In this field, various research efforts are devoted to the preparation of thin films with controllable chemicophysical properties. In the framework of our research activities, we have recently fabricated NiO thin films by means of chemical vapor deposition (CVD) using a series of closely related Ni(II) beta-diketonate-diamine molecular precursors. In the present work, the attention is focused on the x-ray photoelectron spectroscopy (XPS) analysis of a representative NiO film grown at 400 degrees C in an O-2 + H2O reaction atmosphere. Besides the wide scan spectrum, high resolution spectra for C 1s, O 1s, and, in particular, Ni 2p are reported and discussed in detail.

引用

页数：8

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