Characterization of Mn5Ge3 Contacts on a Shallow Ge/SiGe Heterostructure

被引:1
|
作者
Hutchins-Delgado, Troy A. [1 ,2 ,3 ]
Addamane, Sadhvikas J. [1 ,2 ]
Lu, Ping [1 ]
Lu, Tzu-Ming [1 ,2 ]
机构
[1] Sandia Natl Labs, Albuquerque, NM 87185 USA
[2] Ctr Integrated Nanotechnol, Albuquerque, NM 87185 USA
[3] Univ New Mexico, Ctr High Technol Mat, Albuquerque, NM 87106 USA
关键词
Mn5Ge3; Ge/SiGe; thin film; germanide; phase formation; solid-state synthesis; ELECTRICAL SPIN INJECTION; METAL; TRANSISTOR; GERMANIDE; PHASE;
D O I
10.3390/nano14060539
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Mn5Ge3 is a ferromagnetic phase of the Mn-Ge system that is a potential contact material for efficient spin injection and detection. Here, we investigate the creation of Mn5Ge3 -based contacts on a Ge/SiGe quantum well heterostructure via solid-state synthesis. X-ray diffraction spectra fitting indicates the formation of Mn5Ge3 -based contacts on bulk Ge and Ge/SiGe. High-resolution scanning transmission electron microscopy imaging and energy dispersive X-ray spectroscopy verify the correct Mn5Ge3 -based phase formation. Schottky diode measurements, transmission line measurements, and Hall measurements reveal that Mn5Ge3 -based contacts serve as good p-type contacts for Ge/SiGe quantum well heterostructures due to having a low Schottky barrier height of 0.10 eV (extracted from a Mn5Ge3 /n-Ge analogue) and a contact resistance in the order of 1 k omega. Furthermore, we show that these electrical characteristics have a gate-voltage dependence, thereby providing tunability.
引用
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页数:11
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