A nano-metallic-particles-based CMOS image sensor for DNA detection

被引：0

作者：

何进 ^{[1
]}

苏艳梅 ^{[2
]}

马玉涛 ^{[2
]}

陈沁 ^{[2
]}

王若楠 ^{[2
]}

叶韵 ^{[2
]}

马勇 ^{[2
]}

梁海浪 ^{[2
]}

机构：

[1] Micro & Nano Electronic Device and Integrated Technology Center, School of Electronics Engineering and Computer Science, Peking University

[2] Peking University Shenzhen SOC Key Laboratory, PKU-HKUST Shenzhen-Honggang Institution, W, West Tower, IER Bldg, Hi-Tech Industrial Park South

来源：

Chinese Physics B | 2012年 / 21卷 / 07期

关键词：

CMOS image sensor; nano-metallic particles; DNA detection; 0.5 μm CMOS process;

D O I：

暂无

中图分类号：

TN432 [场效应型]; TP212 [发送器（变换器）、传感器];

学科分类号：

080903 ; 1401 ; 080202 ;

摘要：

In this paper we report on a study of the CMOS image sensor detection of DNA based on self-assembled nano-metallic particles, which are selectively deposited on the surface of the passive image sensor. The nano-metallic particles effectively block the optical radiation in the visible spectrum of ordinary light source. When such a technical method is applied to DNA detection, the requirement for a special UV light source in the most popular fluorescence is eliminated. The DNA detection methodology is tested on a CMOS sensor chip fabricated using a standard 0.5 μm CMOS process. It is demonstrated that the approach is highly selective to detecting even a signal-base mismatched DNA target with an extremely-low-concentration DNA sample down to 10 pM under an ordinary light source.

引用

页码：420 / 425

页数：6

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