Sputtering Preparation and Magneto-optical Properties of GdTbFeCo Thin Films

被引：0

作者：

黄致新 ^{[1
]}

机构：

[1] College of Physical Science and Technology,Cental China Normal University

来源：

Journal of Wuhan University of Technology(Materials Science) | 2012年 / 02期

基金：

中国国家自然科学基金;

关键词：

influence; magnetron sputtering parameters; GdTbFeCo thin film; magneto-optical property; variable control method;

D O I：

暂无

中图分类号：

TB383.2 [];

学科分类号：

070205 ; 080501 ; 1406 ;

摘要：

Amorphous GdTbFeCo magnetic thin films were successfully prepared on glass substrates by RF magnetron sputtering system from a mosaic target.The influences of sputtering parameters on the magneto-optical properties GdTbFeCo thin film were investigated by the variable control method.And the influence mechanism was analyzed in detail.After the sputtering parameters were optimized,it was found that when the distance between target and substrate was 72 mm,the thin film thickness was 120 nm,and the sputtering power,sputtering pressure and sputtering time was 75 W,0.5 Pa and 613 s,respectively,the coercivity with perpendicular anisotropy could be as high as 6735 Oe,and the squareness ratio of the hysteresis loop was almost equal to 1.

引用

页码：195 / 198

页数：4