First-Principles Study of Intrinsic Point Defects of Monolayer GeS

被引:0
|
作者
邱晨 [1 ,2 ]
曹茹月 [2 ,3 ]
张才鑫 [2 ]
张陈 [2 ,3 ]
郭丹 [2 ,3 ]
沈涛 [2 ,3 ]
刘竹友 [2 ,3 ]
胡玉莹 [2 ,3 ]
王飞 [1 ]
邓惠雄 [2 ,3 ]
机构
[1] International Laboratory for Quantum Functional Materials of Henan, School of Physics and Microelectronics,Zhengzhou University
[2] State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors,Chinese Academy of Sciences
[3] Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences
基金
中国国家自然科学基金;
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中图分类号
TN304.24 [];
学科分类号
摘要
The properties of six kinds of intrinsic point defects in monolayer GeS are systematically investigated using the "transfer to real state" model,based on density functional theory.We find that Ge vacancy is the dominant intrinsic acceptor defect,due to its shallow acceptor transition energy level and lowest formation energy,which is primarily responsible for the intrinsic p-type conductivity of monolayer GeS,and effectively explains the native p-type conductivity of GeS observed in experiment.The shallow acceptor transition level derives from the local structural distortion induced by Coulomb repulsion between the charged vacancy center and its surrounding anions.Furthermore,with respect to growth conditions,Ge vacancies will be compensated by fewer n-type intrinsic defects under Ge-poor growth conditions.Our results have established the physical origin of the intrinsic p-type conductivity in monolayer GeS,as well as expanding the understanding of defect properties in lowdimensional semiconductor materials.
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页码:69 / 73
页数:5
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