Comparison of Isothermal Oxidation Behavior of Co-10Cr-xSi(x=0,5,10)Alloys at 1 073K

被引:1
|
作者
Junhuai Xiang [1 ]
Ling Wang [1 ]
Honghua Zhang [1 ]
Lingyun Bai [1 ]
Changjun Wan [1 ]
Ganlan Yang [1 ]
机构
[1] Jiangxi Key Laboratory of Surface Engineering,Jiangxi Science and Technology Normal University
基金
中国国家自然科学基金;
关键词
cobalt-chromium-silicon; isothermal oxidation; high temperature; microstructure;
D O I
10.15918/j.jbit1004-0579.18009
中图分类号
TG132.3 [特种热性质合金];
学科分类号
080502 ;
摘要
The oxidation behavior of Co-10 Cr-xSi(x=0,5,10,nominal composition,at%)alloys in 0.1 MPa pure O2 at 1 073 Kwas investigated.Co-10 Cr presents the worst oxidation resistance with the mass gain of about 7.531 mg/cm2 after 24 hoxidation,while Co-10 Cr-10 Si presents the best oxidation resistance with the much lower mass gain of about 0.078 mg/cm2.Co-10 Cr-10 Si is about two magnitudes lower than that of Co-10 Cr.The oxidation behavior of Co-10 Cr-5 Si is intermediate between that of Co-10 Cr and Co-10 Cr-10 Si.The nodular oxides have occupied most of the alloy surface,and their microstructure is similar to Co-10 Cr,to some extent.On the contrary,only a fraction of the surface is covered by the Cr2 O3 layer,whose microstructure is similar to that of Co-10 Cr-10 Si.
引用
收藏
页码:379 / 384
页数:6
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