Novel Silicon Nanotubes

被引:0
作者
Hong Bo CHEN1
机构
关键词
Silicon nanotubes; chemical vapor deposition; chemical etching;
D O I
暂无
中图分类号
TN304.055 [];
学科分类号
0805 ; 080501 ; 080502 ; 080903 ;
摘要
Novel silicon nanotubes with inner-diameter of 60-80 nm was prepared using hydrogen-added dechlorination of SiCl4 followed by chemical vapor deposition (CVD) on a NixMgyO catalyst. The TEM observation showed that the suitable reaction temperature is 973 K for the formation of silicon nanotubes. Most of silicon nanotubes have one open end and some have two closed ends. The shape of nanoscale silicon, however, is a micro-crystal type at 873 K, a rod or needle type at 993 K and an onion-type at 1023 K, respectively.
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页码:1139 / 1140
页数:2
相关论文
共 2 条
  • [1] S.B.Fagan,R.J.Baierle,R.Mota,A.J.R. daSilva,A.Fazzio,Phys. Rev.B . 2000
  • [2] X.T.Zhou,H.L.Lai,H.Y.Peng,F.C.K.Au,L.S.Liao,N.Wang,I.Bello,C.S.Lee,S.T.Lee,Chem. Physics Letters . 2000