Temperature Controlled Lateral Pattern Formation in Confined Polymer Thin Films

被引:0
作者
David G. Bucknall
机构
[1] Department of Materials
[2] University of Oxford Parks Road
[3] Oxford
[4] OX PH
[5] UK
关键词
Thermal induce; Topography change; Polymer thin film; AFM;
D O I
暂无
中图分类号
TB43 [薄膜技术];
学科分类号
0805 ;
摘要
The thermal induced topography change in a model system consisting of a polymer film on a Si substrate capped by a thin metal layer has been studied by using AFM. Regular lateral patterns over large areas were observed on the surface when the system was heated to a sufficiently high temperature. 2D-FFT analysis to the AFM images indicates that the patterns are isotropic and have well defined periodicities. The periodicities of the characteristic patterns are found to depend strongly on the annealing temperature. The study of the kinetics of the formation reveals that such a topography forms almost instantaneously once the critical temperature is reached. It is suggested that this wave-like surface morphology is driven by the thermal expansion coefficient mismatch of the different layers. This method for generating regular wave-like patterns could be used as a general method for patterning various organic materials into micro/nanostructures.
引用
收藏
页码:511 / 515
页数:5
相关论文
共 18 条
[1]  
Wang J. Sun X. Y. Chen L. et al. Applied Physics Letters . 1999
[2]  
Analysis and Design of Structural Sandwich Panels. Allen H. G. Pergamon Press, Oxford . 1969
[3]  
Bowden N. Brittain S. Evans A. G. et al. Nature . 1998
[4]  
HuckW.T.S,BowdenN,WhitesidesG.M.etal. Langmuir . 2000
[5]  
Schaffer E. Harkema S. Roerdink M. et al. Macromolecules . 2003
[6]  
Polym. Adv. Technol . 1996
[7]  
Schaffer E. Thurn-Albrecht T. Russell T. P. et al. Nature . 2000
[8]   MATTER [P]. 
ADAMS HERBERT JOHN FREDERICH ;
ANDERSON JON C ;
BLAIR MURRAY R JR ;
RUBIO ROBERT L DI ;
TAKMAN BERTIL HERBERT .
澳大利亚专利 :AU5258373A ,1974-08-29
[9]  
Dalnoki-VeressK,NickelB.G,DutcherJ.R. Phys.Rev.L ett . 1999
[10]  
Chou S Y,Zhuang L. Journal of Vacuum Science and Technology . 1999