Instability of parasitic capacitance in T-shape-gate enhancementmode AlGaN/GaN MIS-HEMTs

被引:0
|
作者
Lan Bi [1 ,2 ]
Yixu Yao [1 ,2 ]
Qimeng Jiang [1 ,2 ]
Sen Huang [1 ,2 ]
Xinhua Wang [1 ,2 ]
Hao Jin [1 ,2 ]
Xinyue Dai [1 ,2 ]
Zhengyuan Xu [1 ]
Jie Fan [1 ,2 ]
Haibo Yin [1 ,2 ]
Ke Wei [1 ,2 ]
Xinyu Liu [1 ,2 ]
机构
[1] High-Frequency High-Voltage Device and Integrated Circuits R&D Center, Institute of Microelectronics, Chinese Academy of Sciences
[2] Institute of Microelectronics, University of Chinese Academy of Sciences
基金
中国国家自然科学基金;
关键词
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暂无
中图分类号
TN386 [场效应器件];
学科分类号
摘要
Parasitic capacitances associated with overhangs of the T-shape-gate enhancement-mode(E-mode) GaN-based power device, were investigated by frequency/voltage-dependent capacitance–voltage and inductive-load switching measurements. The overhang capacitances induce a pinch-off voltage distinguished from that of the E-mode channel capacitance in the gate capacitance and the gate–drain capacitance characteristic curves. Frequency-and voltage-dependent tests confirm the instability caused by the trapping of interface/bulk states in the LPCVD-SiNx passivation dielectric. Circuit-level double pulse measurement also reveals its impact on switching transition for power switching applications.
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页码:78 / 81
页数:4
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