Titanium nitride deposition by high-power density plasma at room temperature

Titanium nitride films are of many excellent properties, such as high hardness,high wear resistance, high corrosion resistance and beautiful golden color.It has wide application in industry. However, several present techniques, such as chemical vapor deposition, physical vapor deposition and ion beam, have their disadvantages which limit the range of using titanium nitride films. These shortcomings are high deposition temperature, weak adhesion of films to substrate and lower deposition rate.