Diffusion kinetics of nitrogen in tantalum during plasma-nitriding

被引：0
|
作者：
张德元
林勤
曾卫军
李放
许兰萍
付青峰
机构：
来源：
TransactionsofNonferrousMetalsSocietyofChina | 2001年 / 02期
关键词：
tantalum; nitrogen; diffusion activation energy;
D O I：
暂无
中图分类号：
TG156.8 [化学热处理];
学科分类号：
摘要：
The activation energies of nitrogen in tantalum on plasma nitriding conditions were calculated according to the experimental data of hardness of plasma nitriding of tantalum vs time and temperature. The activation energy calculated is 148.873±0.390 kJ/mol. The depth increasing of nitriding layer with time follows square root relation. The nitriding process of tantalum is controlled by diffusion of nitrogen atoms in tantalum solid solution. [
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页码：281 / 282
页数：2
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