Influence of Nitrogen Vacancy Concentration on Mechanical and Electrical Properties of Rocksalt Zirconium Nitride Films

被引:0
作者
KeChang Han [1 ]
GuoQiang Lin [1 ]
Chuang Dong [1 ]
KaiPing Tai [2 ]
Xin Jiang [2 ]
机构
[1] Key Laboratory for Material Modification by Laser,Ion and Electron Beams,(Ministry of Education),Dalian University of Technology
[2] Institute of Metal Research,Chinese Academy of Sciences
关键词
ZrN_x films; Nitrogen vacancy; Hardness; Electrical properties; Band structure;
D O I
暂无
中图分类号
TB383.2 [];
学科分类号
070205 ; 080501 ; 1406 ;
摘要
To study the influence of the nitrogen vacancy(VN)on mechanical and electrical properties of zirconium nitride deeply,Zr Nx films with different VN concentrations were synthesized on the Si(111)substrates by enhanced magnetic filtering arc ion plating.The morphologies,microstructures,residual stresses,compositions,chemical states,mechanical and electrical properties of the as-deposited films were characterized by field-emission scanning electron microscopy,X-ray diffraction,X-ray photoelectron spectrometry,Nanoindenter and Hall effect measurements.The results showed that Zr Nx films exhibited rocksalt single-phase structure within a VN concentration ranging from 26 to 5%.The preferred orientation,thickness,grain size and residual stress of the Zr Nx films kept constant at different VN concentrations.Both the nanohardness and elastic modulus first increased and then decreased with the decrease in VN concentration,reaching the peaks around 16%.And the electric conductivity of the Zr Nx films showed a similar tendency with nanohardness.The underlying atomic-scale mechanisms of VN concentration-dependent hardness and electric conductivity enhancements were discussed and attributed to the different electronic band structures,rather than conventional meso-scale factors,such as preferred orientation,grain size and residual stress.
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页码:1100 / 1108
页数:9
相关论文
共 32 条
[1]  
S.H.Jhi,J.Ihm,S.G.Louie. Nature . 1999
[2]  
A.J.Perry. Thin Solid films . 1990
[3]  
L.Tsetseris,N.Kalfagiannis,S.Logothetidis,S.T.Pantelides. Physics Review Letters . 2007
[4]  
H.Jimenez,E.Restrepo,A.Devia. Surface and Coatings Technology . 2006
[5]  
B.Saha,J.Acharya,T.D.Sands. Journal of Applied Physiology . 2010
[6]  
I.Vurgaftman,J.R.Meyer. Journal of Applied Physiology . 2003
[7]   TECHNOLOGY [P]. 
英国专利 :GB8602522D0 ,1986-04-16
[8]  
R.Yu,Y.H.Jiang,J.Feng,R.F.Zhou,Y.Q.Zhang,R.Zhou. Journal of Materials Science . 2013
[9]  
C.H.Ma,J.H.Huang,H.Chen. Thin Solid films . 2002
[10]  
W.J.Chou,G.P.Yu,J.H.Huang. Surface and Coatings Technology . 2003