Barrier height and ideality factor dependency on identically produced small Au/p-Si Schottky barrier diodes

被引:0
作者
MAYeganeh [1 ]
SHRahmatollahpur [2 ]
机构
[1] Faculty of Physics,Baku State University,Academic Zahid X■lilov ksi-,AZ ,Baku,Azerbaijan
[2] Departments of Physics,Sharif University of Technology,-,Tehran,Iran
关键词
Schottky barrier diodes; conducting probe-atomic force microscope; barrier height and ideality factor;
D O I
暂无
中图分类号
TN311.7 [];
学科分类号
0805 ; 080501 ; 080502 ; 080903 ;
摘要
<正>Small high-quality Au/P-Si Schottky barrier diodes(SBDs) with an extremely low reverse leakage current using wet lithography were produced.Their effective barrier heights(BHs) and ideality factors from current-voltage (Ⅰ-Ⅴ) characteristics were measured by a conducting probe atomic force microscope(C-AFM).In spite of the identical preparation of the diodes there was a diode-to-diode variation in ideality factor and barrier height parameters.By extrapolating the plots the built in potential of the Au /p-Si contact was obtained as Vbi=0.5425 V and the barrier height valueΦb(c-V) was calculated to beΦB(C-V)=0.7145 V for Au/p-Si.It is found that for the diodes with diameters smaller than 100μm,the diode barrier height and ideality factor dependency to their diameters and correlation between the diode barrier height and its ideality factor are nonlinear,where similar to the earlier reported different metal semiconductor diodes in the literature,these parameters for the here manufactured diodes with diameters more than 100μm are also linear.Based on the very obvious sub-nanometer C-AFM produced pictures the scientific evidence behind this controversy is also explained.
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页码:16 / 21
页数:6
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