Dip-pen刻蚀技术直接构建聚-L-赖氨酸纳米结构

被引:4
作者
周化岚
魏刚
刘志国
王丽
宋永海
李壮
机构
[1] 中国科学院长春应用化学研究所电分析化学国家重点实验室
[2] 中国科学院长春应用化学研究所电分析化学国家重点实验室 长春
[3] 长春
关键词
Dip-pen刻蚀技术; 聚-L-赖氨酸; 纳米结构;
D O I
暂无
中图分类号
TG66 [特种加工机床及其加工];
学科分类号
080201 ;
摘要
Dip-pen nanolithography(DPN) has been developed to pattern monolayer film of various molecules in submicrometer dimensions through the controlled movement of ink-coated atomic force microscopy(AFM) tip on a desired substrate, which makes DPN a potentially powerful tool for making the functional nanoscale devices. In this letter, using direct-write dip-pen nanolithography to generate nanoscale patterns of poly-L-lysine on mica was described. Poly-L-lysine molecules can anchor themselves to the mica surface through electrostatic interaction force, so stable poly-L-lysine patterns, such as square, line, circle and cross, could be obtained on freshly cleaved mica surface. From AFM image of the patterned poly-L-lysine nanostructures on mica, we know that poly-L-lysine was flatly bound to the mica surface. These oriented patterns of poly-L-lysine on mica can provide the prospect of building functional nanodevices and offer new options for this technique in a variety of other significant biomolecules.
引用
收藏
页码:757 / 759
页数:3
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