Microstructure and magnetic properties of Ti/Ni/Ti in dependence on Ni layer thickness

被引：0

作者：

ZHANG Hanwei FENG Shunzhen ZHANG Yujie and SUN HuiyuanCollege of Physics Science and Information Engineering Hebei Normal University Shijiazhuang China ^{[50016
]}

机构：

来源：

RareMetals | 2006年 / S1期

关键词：

magnetic recording; magnetron sputtering; coercivity; annealing;

D O I：

暂无

中图分类号：

TG113 [金相学（金属的组织与性能）];

学科分类号：

080502 ;

摘要：

The films of Ti(15 nm)/Ni(t nm)/Ti(15 nm)(t=20, 30, 40, 50) were prepared by dc magnetron sputtering at room temperature and subsequent annealing at 400 ℃ for 30 min. Scanning probe microscope (SPM), vibrating sample magnetometer (VSM) and X-ray diffraction (XRD) were applied to study the magnetic properties and microstructure. AFM images show that small and uniform grains and some clusters appear with the increase of Ni thickness, also MFM images show that the size of domain first decreases and then increases. The coercivity reaches the maximum 48 kA·m-1 at t=30 nm. The XRD profiles show stronger fcc (111) orientation peak of Ni and weak hcp structure peaks of Ni3Ti. This results reveal that the crystal lines have the prefer orientation and achieve the ordered.

引用

页码：592 / 595

页数：4

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