Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition

被引：0

作者：

Eun-Young Yun ^{[1
]}

Woo-Jae Lee ^{[1
]}

Qi Min Wang ^{[2
]}

Se-Hun Kwon ^{[1
]}

机构：

[1] School of Materials Science and Engineering, Pusan National University

[2] School of Electromechanical Engineering, Guangdong University of Technology

来源：

Journal of Materials Science & Technology | 2017年 / 33卷 / 03期

关键词：

Titanium-aluminum nitride; Plasma-enhanced atomic layer deposition; Corrosion protection; Ternary transition metal nitrides;

D O I：

暂无

中图分类号：

TG174.4 [金属表面防护技术];

学科分类号：

摘要：

Titanium-aluminum-nitride（TiAlN） films were grown by plasma-enhanced atomic layer deposition（PEALD）on 316 L stainless steel at a deposition temperature of 200 °C. A supercycle, consisting of one AlN and ten TiN subcycles, was used to prepare TiAlN films with a chemical composition of Ti;Al;N;. The addition of AlN to TiN resulted in an increased electrical resistivity of TiAlN films of 2800 μΩ cm, compared with 475 μΩ cm of TiN films, mainly due to the high electrical resistivity of AlN and the amorphous structure of TiAlN. However, potentiostatic polarization measurements showed that amorphous TiAlN films exhibited excellent corrosion resistance with a corrosion current density of 0.12 μA/cm;, about three times higher than that of TiN films, and about 12.5 times higher than that of 316 L stainless steel.

引用

页码：295 / 299

页数：5

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