Determination of Plasma Parameters in a Dual-Frequency Capacitively Coupled CF4 Plasma Using Optical Emission Spectroscopy

被引：0

作者：

刘文耀 ^{[1
]}

朱爱民 ^{[1
,2
]}

李小松 ^{[1
,2
]}

赵国利 ^{[1
]}

陆文琪 ^{[2
]}

徐勇 ^{[1
,2
]}

王友年 ^{[2
]}

机构：

[1] Laboratory of Plasma Physical Chemistry,Dalian University of Technology

[2] School of Physics and Optoelectronic Technology,Dalian University of Technology

来源：

Plasma Science and Technology | 2013年 / 15卷 / 09期

基金：

中国国家自然科学基金;

关键词：

dual-frequency capacitively coupled plasma(DF CCP); gas temperature; electron temperature; fluorine atom concentration;

D O I：

暂无

中图分类号：

O53 [等离子体物理学];

学科分类号：

070204 ;

摘要：

Optical emission spectroscopy measurements of dual-frequency capacitively coupled CF4 plasmas were carried out.The gas temperature(Tg) was acquired by fitting the optical emission spectra of a CF B X system in 201206 nm.The atomic fluorine concentration and the electron temperature(Te) were obtained by trace rare gas optical emission spectroscopy and a modified Boltzmann plot technique,respectively.It was found that the gas temperature was about 620±30 K at 50 mTorr and the atomic fluorine concentration increased while the electron temperature decreased with increasing gas pressure and power of high frequency(60 MHz).With increasing low frequency(2 MHz) power,the electron temperature also increased,but the atomic fluorine concentration was insensitive to this change.The generation and disappearance mechanisms of F atoms are discussed.

引用

页码：885 / 890

页数：6