Plasma-nitriding of tantalum at relatively low temperature

被引：0

作者：

ZHANG Deyuan

LIN Qin

ZHAO Haomin

FEI Qinyong

GENG Man National R D Center for Surface Engineering of China Shenzhen China University of Science and Technology Beijing Beijing China ^{[518029
,100083
]}

机构：

来源：

Rare Metals | 2004年 / 02期

关键词：

surface and interface of materials; plasma nitriding; orthogonal regression method; tantalum;

D O I：

暂无

中图分类号：

TG156.8 [化学热处理];

学科分类号：

080201 ; 080503 ;

摘要：

<正> The combined quadratic orthogonal regression method of experiment design was employed to explore the effectsof process parameters of plasma nitriding of tantalum such as total pressure, temperature and original hydrogen molar frac-tion on the hardness, roughness and structure of nitriding surfaces. The regression equations of hardness, roughness andstructure were given according to the results of regression and statistic analysis. And the diffusion activation energy of ni-trogen in tantalum on plasma nitriding conditions was calculated according to the experimental data of hardness ofplasma-nitriding of tantalum vs time and temperature. The diffusion activation energy calculated belongs to (155.49±10.51)kJ/mol(783-983K).

引用

页码：185 / 188

页数：4