Incorporation of Nitrogen Into Amorphous Carbon Films Produced by Surface-Wave Plasma Chemical Vapor Deposition

被引：0
作者：
吴玉祥
朱晓东
詹如娟
机构：
[1] China
[2] Department of Modern Physics
[3] Hefei 230027
[4] University of Science and Technology of China
来源：
Plasma Science & Technology | 2003年 / 06期
基金：
中国国家自然科学基金;
关键词：
nitrogenated amorphous carbon film; incorporation of nitrogen; optical emission spectroscopy; surface wave plasma; Raman;
D O I：
暂无
中图分类号：
O613 [非金属元素及其化合物];
学科分类号：
070301 ; 081704 ;
摘要：
In order to study the Iifluence of nitrogen incorporated into amorphous carbon films,nitrogenated amorphous carbon films have been deposited by using surface wave plasma chemicalvapor deposition under various ratios of N;/CH;gas flow.Optical emission spectroscopy hasbeen used to monitor plasma features near the deposition zone.After deposition,the samples arechecked by Raman spectroscopy and x-ray photo spectroscopy（XPS）.Optical emission intensities
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收藏
页码：2063 / 2070
页数：8
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