Magnetic anisotropy of Fe films deposited by dc magnetron sputtering under an external magnetic field

被引：0
|
作者：
Jiahui Chen [1 ]
Jing Ma [1 ]
Liang Wu [1 ]
Yang Shen [1 ]
Ce-Wen Nan [1 ]
机构：
[1] School of Materials Science and Engineering, State Key Laboratory of New Ceramics and Fine Processing, Tsinghua University
来源：
Science Bulletin | 2015年 / 60卷 / 13期
基金：
中国国家自然科学基金;
关键词：
Growth magnetic field; Magnetic anisotropy; Crystallization; Magnetron sputtering;
D O I：
暂无
中图分类号：
TB383.2 [];
学科分类号：
070205 ; 080501 ; 1406 ;
摘要：
Magnetic Fe films grown on single-crystal Mg O(001) and(011) substrates were prepared by direct current magnetron sputtering. The experimental results showed that by applying an external magnetic field of about 300 Oe to film during deposition, a fourfold cubic magnetic anisotropy on Mg O(001) substrate and a twofold uniaxial magnetic anisotropy on Mg O(011) substrate were generated, compared to the isotropic magnetization of Fe film grown without applying the external magnetic field.Our results suggested that external magnetic field during preparation effectively induced relatively higher surface mobility of sputtered Fe atoms and further promoted the crystallization of Fe film and the enhancement of magnetic anisotropy.
引用
收藏
页码：1214 / 1217
页数：4
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