A novel double-trench LVTSCR used in the ESD protection of a RFIC

被引:1
|
作者
李立 [1 ]
刘红侠 [1 ]
机构
[1] Key Laboratory of the Ministry of Education for Wide Band Gap Semiconductor Materials and Devices,School of Microelectronics,Xidian University
基金
国家国防基金; 中国国家自然科学基金;
关键词
UDSM; LVTSCR; RFIC; ESD design window;
D O I
暂无
中图分类号
TN349 [可控硅的应用];
学科分类号
0805 ; 080501 ; 080502 ; 080903 ;
摘要
A low-voltage triggering silicon-controlled rectifier(LVTSCR),for its high efficiency and low parasitic parameters,has many advantages in ESD protection,especially in ultra-deep sub-micron(UDSM) IC and high frequency applications.In this paper,the impact factors of the snapback characteristics of a LVTSCR and the configuring modes are analyzed and evaluated in detail.These parameters include anode series resistance,gate voltage,structure and size of devices.In addition,a double-trench LVTSCR is presented that can increase the hold-on voltage effectively and offers easy adjustment.Also,its snapback characteristics can obey the ESD design window rule very well.The strategy of ESD protection in a RFIC using a LVTSCR is discussed at the end of the paper.
引用
收藏
页码:53 / 57
页数:5
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