Structure and mechanical properties of Zr/TiAlN films prepared by plasma-enhanced magnetron sputtering

被引：0

作者：

Guang Xian ^{[1
]}

Hai-Bo Zhao ^{[2
]}

Hong-Yuan Fan ^{[1
]}

Hao Du ^{[1
]}

机构：

[1] School of Manufacture Science and Engineering,Sichuan University

[2] The Analysis and Testing Centre,Sichuan University

来源：

RareMetals | 2015年 / 34卷 / 10期

基金：

中国国家自然科学基金;

关键词：

TiAlN films; Structure; Orientation; Hardness; Adhesion;

D O I：

暂无

中图分类号：

TB383.2 [];

学科分类号：

070205 ; 080501 ; 1406 ;

摘要：

The purpose of this study was to investigate the effects of Zr interlayer on the structure and mechanical properties of TiAlN films, which were deposited on the M2 high-speed steel substrates by means of plasma-enhanced magnetron sputtering. The result shows that the crystal orientation of Zr/TiAlN films is similar to that of single-layered TiAlN films, but the difference is that AlN(111) of Zr/TiAlN films disappears completely. With respect to Zr interlayer, the texture coefficient of Zr/TiAlN films is approximately 1. Zr/TiAlN films exhibit a compact isometric structure, which is distinctly different from the columnar structure existing in the single-layered TiAlN films and Ti/TiAlN films. The hardness and H3/E*2 of Zr/TiAlN films are, respectively, enhanced to be 36.6 GPa and 0.147. With a few cracks emerging around the indention, the adhesion strength of TiAlN films is obviously advanced by adding Zr metal interlayer.

引用

页码：717 / 724

页数：8

共 27 条

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