Structural and optical analysis of Cr2N thin films prepared by DC magnetron sputtering

被引:0
作者
Shakil Khan [1 ]
A.Mahmood [2 ]
A.Shah [2 ]
Qaiser Raza [2 ]
Muhammad Asim Rasheed [1 ]
Ishaq Ahmad [3 ]
机构
[1] Department of Metallurgy and Materials Engineering, Pakistan Institute of Engineering and Applied Sciences
[2] National Institute of Laser and Optronics (NILOP)  3. National Centre for Physics, Quaid-i-Azam University
关键词
chromium nitride; thin films; magnetron sputtering; structural analysis; optical analysis; refractive index;
D O I
暂无
中图分类号
TB383.2 [];
学科分类号
070205 ; 080501 ; 1406 ;
摘要
Chromium nitride(Cr2N) thin films were prepared by a DC magnetron sputtering technique. The deposition temperature was raised from 50 to 300°C, and its influence on the film structure and refractive index was investigated. X-ray diffraction analysis shows that the crystalline structure of the films transforms from the(101) to(002) oriented hexagonal Cr2 N phase as the increase of substrate temperature above 50°C, and a highly textured film grows at 100°C. An empirical relation between the crystalline orientation and infrared active modes of the films is obtained, i.e., the Fourier transform infrared(FTIR) spectrum of the film prepared at 50°C exhibits only A1(TO) mode. The prominent peak in the FTIR spectra of the film prepared above 50°C is assigned to the E1(TO) mode and is correlated with the(002) or c-axis oriented hexagonal wurtzite phase of Cr2 N. In the surface analysis of atomic force microscopy, a transformation from the featureless surface to columnar-type morphology is observed with the increase of substrate temperature from 50 to 100°C, exhibiting c-axis oriented crystallite growth. A further increase in substrate temperature to 200°C causes the c-axis crystallites to merge, resulting in the formation of voids. The refractive index(n) of the deposited films is obtained using spectroscopic ellipsometry.
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页码:197 / 202
页数:6
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