Negative transconductance effect in p-GaN gate AlGaN/GaN HEMTs by traps in unintentionally doped GaN buffer layer

被引:0
|
作者
葛梅 [1 ]
蔡青 [1 ]
张保花 [2 ]
陈敦军 [1 ]
胡立群 [1 ]
薛俊俊 [3 ]
陆海 [1 ]
张荣 [1 ]
郑有炓 [1 ]
机构
[1] The Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering,Nanjing University
[2] Department of Physics, Changji College
[3] School of Electronic Science and Engineering, Nanjing University of Posts and Telecommunications
基金
中国国家自然科学基金;
关键词
AlGaN/GaN; high-electron-mobility transistors(HEMTs); traps; negative transconductance;
D O I
暂无
中图分类号
TN386 [场效应器件];
学科分类号
0805 ; 080501 ; 080502 ; 080903 ;
摘要
We investigate the negative transconductance effect in p-GaN gate AlGaN/GaN high-electron-mobility transistor(HEMT) associated with traps in the unintentionally doped GaN buffer layer. We find that a negative transconductance effect occurs with increasing the trap concentration and capture cross section when calculating transfer characteristics.The electron tunneling through AlGaN barrier and the reduced electric field discrepancy between drain side and gate side induced by traps are reasonably explained by analyzing the band diagrams, output characteristics, and the electric field strength of the channel of the devices under different trap concentrations and capture cross sections.
引用
收藏
页码:508 / 513
页数:6
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