MEASUREMENT OF VACANCY MIGRATION ENERGY BY ELECTRON IRRADIATION

被引：0

作者：

WAN Farong XIAO Jimei YUAN Yi University of Science and Technology BeijingBeijingChina Lecturer Department of Material PhysicsUniversity of Science and Technology BeijingBeijing China ^{[100083
]}

机构：

来源：

Acta Metallurgica Sinica(English Edition) | 1990年 / 05期

关键词：

electron irradiation damage; vacancy migration energy; interstitial loop;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

<正> A method together with a new formula were developed for measuring the vacancy migrationenergy on HVEM considering the effect of surface sink of specimen on point defects.The va-cancy migration energy may be calculated through the loop growth rate under electronirradiation at various temperatures.

引用

页码：372 / 374

页数：3