The electronic structures and optical properties of β-GaOand Si-and Sn-doped β-GaOare studied using the GGA + U method based on density functional theory. The calculated bandgap and Ga 3d-state peak of β-GaOare in good agreement with experimental results. Si-and Sn-doped β-GaOtend to form under O-poor conditions, and the formation energy of Si-doped β-GaOis larger than that of Sn-doped β-GaObecause of the large bond length variation between Ga–O and Si–O. Si-and Sn-doped β-GaOhave wider optical gaps than β-GaO, due to the Burstein–Moss effect and the bandgap renormalization effect. Si-doped β-GaOshows better electron conductivity and a higher optical absorption edge than Sn-doped β-GaO, so Si is more suitable as a dopant of n-type β-GaO, which can be applied in deep-UV photoelectric devices.