Controlled wrinkling analysis of thin films on gradient substrates

被引:0
作者
Jianzhong ZHAO
Xingming GUO
Lu LU
机构
[1] ShanghaiInstituteofAppliedMathematicsandMechanics,ShanghaiKeyLaboratoryofMechanicsinEnergyEngineering,ShanghaiUniversity
关键词
thin film; gradient substrate; wrinkle; material gradient; Galerkin method;
D O I
暂无
中图分类号
O484 [薄膜物理学];
学科分类号
080501 ; 1406 ;
摘要
The paper investigates continuously changing wrinkle patterns of thin films bonded to a gradient substrate. Three types of gradient substrates including exponential,power-law, and symmetry models are considered. The Galerkin method is used to discretize the governing equation of film bonded to gradient substrates. The wavelength and the normalized amplitude of the wrinkles for substrates of various material gradients are obtained. The numerical simulation based on the finite element method(FEM) is used to evolve the wrinkle patterns. The result agrees well with that of the analytical model.It is concluded that localization of wrinkle patterns strongly depends on the material gradient. The critical membrane force depends on both the minimum value of wrinkle stiffness and the gradient of wrinkle stiffness when the wrinkle stiffness is at its minimum.This work provides a better understanding for local wrinkle formation caused by gradient substrates.
引用
收藏
页码:617 / 624
页数:8
相关论文
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