A review on polishing technology of large area free-standing CVD diamond films

被引：0
|
作者：
ZHANG Pingwei [1 ,2 ]
TONG Tingting [1 ]
LI Yifeng [1 ,2 ]
机构：
[1] Hebei Plasma Diamond Technology Co,Ltd
[2] Hebei Institute of
来源：
金刚石与磨料磨具工程 | 2019年 / 39卷 / 06期
关键词：
large area free-standing CVD diamond films; mechanical polishing; chemical mechanical polishing; tribochemical polishing technology;
D O I：
10.13394/j.cnki.jgszz.2019.6.0010
中图分类号：
TB306 []; TB383.2 [];
学科分类号：
摘要：
Recently, with the rapid development of chemical vapor deposition(CVD) technology, large area free-standing CVD diamond films have been produced successfully. However, the coarse grain size on the surface and the non-uniform thickness of unprocessed CVD diamond films make it difficult to meet the application requirement. The current study evaluates several existing polishing methods for CVD diamond films, including mechanical polishing, chemical mechanical polishing and tribochemical polishing technology.
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页码：53 / 61
页数：9
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