Structural and optical properties of Al1-xInxN epilayers on GaN template grown by metalorganic chemical vapor deposition
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卢国军
[1
]
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朱建军
[1
]
江德生
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ry on Integrated Optoelectronics,Institute of Semiconductors,the Chinese Academy of Sciences,P.O.Box 912,Beijing 100083,Chinary on Integrated Optoelectronics,Institute of Semiconductors,the Chinese Academy of Sciences,P.O.Box 912,Beijing 100083,China
江德生
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王玉田
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ry on Integrated Optoelectronics,Institute of Semiconductors,the Chinese Academy of Sciences,P.O.Box 912,Beijing 100083,Chinary on Integrated Optoelectronics,Institute of Semiconductors,the Chinese Academy of Sciences,P.O.Box 912,Beijing 100083,China
王玉田
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赵德刚
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ry on Integrated Optoelectronics,Institute of Semiconductors,the Chinese Academy of Sciences,P.O.Box 912,Beijing 100083,Chinary on Integrated Optoelectronics,Institute of Semiconductors,the Chinese Academy of Sciences,P.O.Box 912,Beijing 100083,China
赵德刚
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刘宗顺
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ry on Integrated Optoelectronics,Institute of Semiconductors,the Chinese Academy of Sciences,P.O.Box 912,Beijing 100083,Chinary on Integrated Optoelectronics,Institute of Semiconductors,the Chinese Academy of Sciences,P.O.Box 912,Beijing 100083,China
刘宗顺
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张书明
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ry on Integrated Optoelectronics,Institute of Semiconductors,the Chinese Academy of Sciences,P.O.Box 912,Beijing 100083,Chinary on Integrated Optoelectronics,Institute of Semiconductors,the Chinese Academy of Sciences,P.O.Box 912,Beijing 100083,China
张书明
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]
杨辉
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ry on Integrated Optoelectronics,Institute of Semiconductors,the Chinese Academy of Sciences,P.O.Box 912,Beijing 100083,China
Suzhou Institute of Nano-tech and Nano-bionics,the Chinese Academy of Sciencesry on Integrated Optoelectronics,Institute of Semiconductors,the Chinese Academy of Sciences,P.O.Box 912,Beijing 100083,China
杨辉
[1
,2
]
机构:
[1] ry on Integrated Optoelectronics,Institute of Semiconductors,the Chinese Academy of Sciences,P.O.Box 912,Beijing 100083,China
[2] Suzhou Institute of Nano-tech and Nano-bionics,the Chinese Academy of Sciences
metalorganic chemical vapor deposition;
Al1;
xInxN;
gradual variation in composition;
optical reflectance spectra;
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中图分类号:
TN304.2 [化合物半导体];
学科分类号:
0805 ;
080501 ;
080502 ;
080903 ;
摘要:
This paper reports that Al1 xInxN epilayers were grown on GaN template by metalorganic chemical vapor de-position with an In content of 7%-20%. X-ray diffraction results indicate that all these Al1 xInxN epilayers have a relatively low density of threading dislocations. Rutherford backscattering/channeling measurements provide the exact compositional information and show that a gradual variation in composition of the Al1 xInxN epilayer happens along the growth direction. The experimental results of optical reflection clearly show the bandgap energies of Al1 xInxN epilayers. A bowing parameter of 6.5 eV is obtained from the compositional dependence of the energy gap. The cathodoluminescence peak energy of the Al1 xInxN epilayer is much lower than its bandgap, indicating a relatively large Stokes shift in the Al1 xInxN sample.
机构:
Sungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon, South Korea
Korea Adv Nano Fab Ctr KANC, Suwon, South KoreaSungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon, South Korea
Song, Keun-Man
Kang, Pil-Geun
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Korea Adv Nano Fab Ctr KANC, Suwon, South KoreaSungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon, South Korea
Kang, Pil-Geun
Shin, Heung-Soo
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Korea Adv Nano Fab Ctr KANC, Suwon, South KoreaSungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon, South Korea
Shin, Heung-Soo
Kim, Jong-Min
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Korea Adv Nano Fab Ctr KANC, Suwon, South KoreaSungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon, South Korea
Kim, Jong-Min
Park, Won-Kyu
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机构:
Korea Adv Nano Fab Ctr KANC, Suwon, South KoreaSungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon, South Korea
Park, Won-Kyu
Ko, Chul-Gi
论文数: 0引用数: 0
h-index: 0
机构:
Korea Adv Nano Fab Ctr KANC, Suwon, South KoreaSungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon, South Korea
Ko, Chul-Gi
Shim, Hyun-Wook
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Samsung LED, Suwon, South KoreaSungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon, South Korea
Shim, Hyun-Wook
Yoon, Dae Ho
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Sungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon, South KoreaSungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon, South Korea
机构:
Chinese Acad Sci, Inst Phys, State Key Lab Surface Phys, Beijing 100080, Peoples R ChinaChinese Acad Sci, Inst Phys, State Key Lab Surface Phys, Beijing 100080, Peoples R China
Li, DS
Chen, H
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Chinese Acad Sci, Inst Phys, State Key Lab Surface Phys, Beijing 100080, Peoples R ChinaChinese Acad Sci, Inst Phys, State Key Lab Surface Phys, Beijing 100080, Peoples R China
Chen, H
Yu, HB
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Chinese Acad Sci, Inst Phys, State Key Lab Surface Phys, Beijing 100080, Peoples R ChinaChinese Acad Sci, Inst Phys, State Key Lab Surface Phys, Beijing 100080, Peoples R China
Yu, HB
Zheng, XH
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Chinese Acad Sci, Inst Phys, State Key Lab Surface Phys, Beijing 100080, Peoples R ChinaChinese Acad Sci, Inst Phys, State Key Lab Surface Phys, Beijing 100080, Peoples R China
Zheng, XH
Huang, Q
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Chinese Acad Sci, Inst Phys, State Key Lab Surface Phys, Beijing 100080, Peoples R ChinaChinese Acad Sci, Inst Phys, State Key Lab Surface Phys, Beijing 100080, Peoples R China
Huang, Q
Zhou, JM
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Chinese Acad Sci, Inst Phys, State Key Lab Surface Phys, Beijing 100080, Peoples R ChinaChinese Acad Sci, Inst Phys, State Key Lab Surface Phys, Beijing 100080, Peoples R China
机构:
Matsushita Elect Ind Co Ltd, Semicond Device Res Ctr, Kyoto 6178520, JapanMatsushita Elect Ind Co Ltd, Semicond Device Res Ctr, Kyoto 6178520, Japan
Takizawa, Toshiyuki
Nakazawa, Satoshi
论文数: 0引用数: 0
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机构:
Matsushita Elect Ind Co Ltd, Semicond Device Res Ctr, Kyoto 6178520, JapanMatsushita Elect Ind Co Ltd, Semicond Device Res Ctr, Kyoto 6178520, Japan
Nakazawa, Satoshi
Ueda, Tetsuzo
论文数: 0引用数: 0
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机构:
Matsushita Elect Ind Co Ltd, Semicond Device Res Ctr, Kyoto 6178520, JapanMatsushita Elect Ind Co Ltd, Semicond Device Res Ctr, Kyoto 6178520, Japan