Field Electron Emission from Diamond - like Carbon Films

被引：0
|
作者：
ZHANG Bing-lin 1
2.Zhengzhou Institute of Aeronautical Industrial Management
机构：
来源：
Semiconductor Photonics and Technology | 1999年 / 03期
关键词：
Chemical Vapor Deposition; Diamond; Diamond-like Carbon; Field Emission CLC number:O472 Document code:A;
D O I：
暂无
中图分类号：
O472 [半导体性质];
学科分类号：
摘要：
A low turn-on field electron emission from diamond-like carbon films has been observed for the first time to author’s knowledge.Carbon films were prepared by microwave plasma chemical vapor deposition (CVD).Special pretreatment ceramic substrates were used. The characteristics of the film have been identified by using X-ray diffraction(XRD),and Raman spectrum. The field emission experiment has been performed in a vacuum chamber with a base pressure of about 10 -5 Pa. The turn-on field of 1.2 V/μm,and the current density of 1.25 mA/cm 2 at electric field of 6 V/μm were obtained.
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页码：152 / 155
页数：4
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