Effect of E × B electron drift and plasma discharge in dc magnetron sputtering plasma

被引：1
作者：
Sankar Moni Borah
Arup Ratan Pal
Heremba Bailung
Joyanti Chutia
机构：
[1] PlasmaPhysicsLaboratory,MaterialSciencesDivision,InstituteofAdvancedStudyinScienceandTechnology,PaschimBoragaon,Guwahati-,Assam,India
来源：
Chinese Physics B | 2011年 / 01期
关键词：
electron drift velocity; Mach probe; cylindrical magnetron; sputtering;
D O I：
暂无
中图分类号：
O53 [等离子体物理学];
学科分类号：
070204 ;
摘要：
Study of electron drift velocity caused by E × B motion is done with the help of a Mach probe in a dc cylindrical magnetron sputtering system at different plasma discharge parameters like discharge voltage,gas pressure and applied magnetic field strength.The interplay of the electron drift with the different discharge parameters has been investigated.Strong radial variation of the electron drift velocity is observed and is found to be maximum near the cathode and it decreases slowly with the increase of radial distance from the cathode.The sheath electric field,E measured experimentally from potential profile curve using an emissive probe is contributed to the observed radial variation of the electron drift velocity.The measured values of the drift velocities are also compared with the values from the conventional theory using the experimental values of electric and magnetic fields.This study of the drift velocity variation is helpful in providing a useful insight for determining the discharge conditions and parameters for sputter deposition of thin film.
引用
收藏
页码：439 / 447
页数：9
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