Fabrication of a monolithic 4H-SiC junction barrier schottky diode with the capability of high current

被引:0
|
作者
SONG QingWen [1 ,2 ]
YUAN Hao [2 ]
HAN Chao [2 ]
ZHANG YuMing [2 ]
TANG XiaoYan [2 ]
ZHANG YiMeng [2 ]
GUO Hui [2 ]
ZHANG YiMen [2 ]
JIA RenXu [2 ]
WANG YueHu [2 ]
机构
[1] School of Advanced Materials and Nanotechnology,Xidian University
[2] Key Laboratory of Wide Band Gap Semiconductor Materials and Devices,Xidian University
基金
国家教育部博士点专项基金资助; 中国国家自然科学基金;
关键词
4H-SiC; JBS; current capability; breakdown voltage;
D O I
暂无
中图分类号
TN311.7 [];
学科分类号
0805 ; 080501 ; 080502 ; 080903 ;
摘要
There is a great interest in monolithic 4H-Si C Junction Barrier Schottky(JBS) diodes with the capability of a high forward current for industrial power applications.In this paper,we report large-area monolithic 4H-Si C JBS diodes fabricated on a 10 μm 4H-Si C epitaxial layer doped to 6×1015 cm3.JBS diodes with an active area of 30 mm2 had a forward current of up to 330 A at a forward voltage of 5 V,which corresponds to a current density of 1100 A/cm2.A near ideal breakdown voltage of 1.6 k V was also achieved for a reverse current of up to 100 A through the use of an optimum multiple floating guard rings(MFGR) termination,which is about 87.2% of the theoretical value.The differential specific-on resistance(RSP-ON) was measured to be 3.3 m cm2,leading to a FOM(VB2/RSP-ON) value of 0.78 GW/cm2,which is very close to the theoretical limit of the tradeoff between the specific-on resistance and breakdown voltage for 4H-Si C unipolar devices.
引用
收藏
页码:1369 / 1374
页数:6
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