Influence of HF catalyst on the microstructure properties of ultra low-k thin films prepared by sol-gel method

被引:0
作者
何志巍 [1 ]
徐大印 [2 ]
江祥华 [3 ]
王印月 [3 ]
机构
[1] College of Science, China Agricultural University
[2] School of Opto-Electronic Information, Yantai University
[3] Department of Physics, Lanzhou University
关键词
microstructure; dielectric; catalyst; sol-gel;
D O I
暂无
中图分类号
O484.1 [薄膜的生长、结构和外延];
学科分类号
080501 ; 1406 ;
摘要
This paper reports that by using the hydrofluoric acid (HF) as the acid catalyst, F doped nanoporous low-k SiO 2 thin films have been prepared by means of sol-gel method. The characterization of atomic force microscopy and Fourier transform infrared spectroscopy demonstrates that the HF catalyzed films are more hydrophobic. The N 2 adsorption/desorption experiments show that the suited introduction of HF increases the porosity and decreases the pore size distribution (about 10 nm) in the films. The above results indicate that the hydrofluoric acid is the more suitable acid catalyst than the hydrochloric one for preparing nanoporous ultra low-k SiO 2 thin films.
引用
收藏
页码:3021 / 3025
页数:5
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