Langmuir Probe Measurements of an Expanding Argon Plasma

被引：0

作者：

曹小岗 ^{[1
]}

夏玉玺 ^{[1
]}

陈炳周 ^{[1
]}

田树平 ^{[1
]}

王春玲 ^{[1
]}

杨党校 ^{[1
]}

薛晓艳 ^{[1
]}

张卫卫 ^{[1
]}

王建强 ^{[1
]}

苟富均 ^{[1
]}

朱自川 ^{[1
]}

欧巍 ^{[1
]}

陈顺礼 ^{[1
]}

机构：

[1] Key Laboratory of Radiation Physics and Technology,Ministry of Education,Institute of Nuclear Science and Technology,Sichuan University

来源：

Plasma Science and Technology | 2015年 / 01期

基金：

中国国家自然科学基金;

关键词：

PECVD; argon plasma; electron temperature; electron density;

D O I：

暂无

中图分类号：

O536 [辐射与测量];

学科分类号：

摘要：

In this work,we studied the effects of the discharge current,gas flow rate and vessel pressure on the electron temperature and density of Ar plasma by Langmuir probe measurement.The argon plasma was created by a one-cathode arc source.The experimental results show that with increasing discharge current and gas flow rate,the electron temperature and density increase.It is found that when the discharge current is 70 A,90 A and HO A at an argon flow rate of2000 seem,the electron densities at about 0.186 m distance from the nozzle are 13.00×10m,14.04×10mand 15.62×10m,and the electron temperatures are 0.38 eV,0.58 eV and0.71 eV,respectively.The positive I-V characteristic is explained.

引用

页码：20 / 24

页数：5

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