Studies on the Adsorption of Amino Methylene Phosphonic Acid Resin for Holmium(Ⅲ)

被引:1
|
作者
吴香梅
熊春华
姚彩萍
机构
[1] Biotechnology and Environmental Engineering
[2] Hangzhou University of Commerce Lishui 323000
[3] China
[4] Hangzhou 310035
[5] Department of Chemistry
[6] Lishui Teachers College
[7] College of Food Science
[8] Hangzhou University of Commerce
关键词
matallurgical technology; amino methylene phosphonic acid resin; Ho; adsorption mechanism; rare earths;
D O I
暂无
中图分类号
O647.3 [吸附];
学科分类号
摘要
The adsorption behavior and mechanism of a novel chelate resin, amino methylene phosphonic acid resin (APAR) for Ho(Ⅲ) were investigated. The statically saturated adsorption capacity is 258 mg·g-1 resin at 298 K in HAc-NaAc medium. The Ho(Ⅲ) adsorbed on APAR can be repeatedly eluted by 3.0 mol·L-1 HCl and the elution percentage is as high as 95.8%. The resin can be regenerated and reused without apparent decrease in adsorption capacity. The apparent adsorption rate constant is k298=1.14×10-5 s-1. The adsorption behavior of APAR for Ho(Ⅲ) obeys the Freundlich isotherm. The thermodynamic adsorption parameter, enthalpy change ΔH of APAR for Ho(Ⅲ) is 11.4 kJ·mol-1. The apparent activation energy is Ea=15.8 kJ·mol-1. The molar coordination ratio of the functional group of APAR to Ho(Ⅲ) is about 2∶1. The adsorption mechanism of APAR for Ho(Ⅲ) was examined by using chemical method and IR spectrometry.
引用
收藏
页码:613 / 617
页数:5
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